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A New Type of Low-kappa Dielectric Films Based on Polysilsesquioxanes

Su, R. Q. / Muller, T. E. / Prochazka, J. / Lercher, J. A.

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A New Type of Low-kappa Dielectric Films Based on Polysilsesquioxanes

Su, R. Q. / Muller, T. E. / Prochazka, J. / Lercher, J. A.

A New Type of Low-kappa Dielectric Films Based on Polysilsesquioxanes

Su, R. Q. / Muller, T. E. / Prochazka, J. / Lercher, J. A.

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Check availability in my library

Order at Subito €

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Document information

Title:

A New Type of Low-kappa Dielectric Films Based on Polysilsesquioxanes

Contributors:

Su, R. Q. (author) / Muller, T. E. (author) / Prochazka, J. (author) / Lercher, J. A. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 14 ; 1369-1373

Publication date:

2002-01-01

Size:

5 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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