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    High-temperature slow crack growth of an Yb2O3-SiO2-doped hot-pressed silicon nitride ceramic

    New search for: Guo, S.
    New search for: Hirosaki, N.
    New search for: Yamamoto, Y.
    New search for: Nishimura, T.
    New search for: Tanaka, H.

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    High-temperature slow crack growth of an Yb2O3-SiO2-doped hot-pressed silicon nitride ceramic

    New search for: Guo, S.
    New search for: Hirosaki, N.
    New search for: Yamamoto, Y.
    New search for: Nishimura, T.
    New search for: Tanaka, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    High-temperature slow crack growth of an Yb2O3-SiO2-doped hot-pressed silicon nitride ceramic

    New search for: Guo, S.
    New search for: Hirosaki, N.
    New search for: Yamamoto, Y.
    New search for: Nishimura, T.
    New search for: Tanaka, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    High-temperature slow crack growth of an Yb2O3-SiO2-doped hot-pressed silicon nitride ceramic

    Contributors:

    Guo, S. (author) / Hirosaki, N. (author) / Yamamoto, Y. (author) / Nishimura, T. (author) / Tanaka, H. (author)

    Published in:

    MATERIALS LETTERS ; 57 ; 3257-3264

    Publication date:

    2003-01-01

    Size:

    8 pages

    ISSN:

    0167-577X

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.1105 / 530

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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