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Non-Destructive SiC Wafer Evaluation Based on an Optical Stress Technique

Ma, X. / Parker, M. / Ma, Y. / Kubota, T. / Sudarshan, T. S.

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Non-Destructive SiC Wafer Evaluation Based on an Optical Stress Technique

Ma, X. / Parker, M. / Ma, Y. / Kubota, T. / Sudarshan, T. S.

Non-Destructive SiC Wafer Evaluation Based on an Optical Stress Technique

Ma, X. / Parker, M. / Ma, Y. / Kubota, T. / Sudarshan, T. S.

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Check availability in my library

Order at Subito €

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Document information

Title:

Non-Destructive SiC Wafer Evaluation Based on an Optical Stress Technique

Contributors:

Ma, X. (author) / Parker, M. (author) / Ma, Y. (author) / Kubota, T. (author) / Sudarshan, T. S. (author) / Bergman, P. / Janzen, E.

Published in:

Silicon Carbide and Related Materials 2002 ; 361-364

MATERIALS SCIENCE FORUM ; 433/436

Publication date:

2003-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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