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    Hall-Petch relationship in pulsed-laser deposited nickel films

    New search for: Knapp, J. A.
    New search for: Follstaedt, D. M.

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    Hall-Petch relationship in pulsed-laser deposited nickel films

    New search for: Knapp, J. A.
    New search for: Follstaedt, D. M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Hall-Petch relationship in pulsed-laser deposited nickel films

    New search for: Knapp, J. A.
    New search for: Follstaedt, D. M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    Hall-Petch relationship in pulsed-laser deposited nickel films

    Contributors:

    Knapp, J. A. (author) / Follstaedt, D. M. (author)

    Published in:

    JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 19 ; 218-227

    Publication date:

    2004-01-01

    Size:

    10 pages

    ISSN:

    0884-2914

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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