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Effect of yttrium ion implantation on the oxidation of alumina formers at 1173 K
Effect of yttrium ion implantation on the oxidation of alumina formers at 1173 K
Effect of yttrium ion implantation on the oxidation of alumina formers at 1173 K
Cueff, R. (author) / Buscail, H. (author) / Caudron, E. (author) / Riffard, F. (author) / Issartel, C. (author) / El Messki, S. (author)
MATERIAUX ET TECHNIQUES ; 93-98
2003-01-01
6 pages
Article (Journal)
English
DDC:
620.11
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