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Properties of Tin Oxide Films Prepared by MOCVD

Choi, G. P. / Park, Y. J. / Noh, W. S. / Park, J. S.

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Properties of Tin Oxide Films Prepared by MOCVD

Choi, G. P. / Park, Y. J. / Noh, W. S. / Park, J. S.

Properties of Tin Oxide Films Prepared by MOCVD

Choi, G. P. / Park, Y. J. / Noh, W. S. / Park, J. S.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Properties of Tin Oxide Films Prepared by MOCVD

Contributors:

Choi, G. P. (author) / Park, Y. J. (author) / Noh, W. S. (author) / Park, J. S. (author) / Kang, S.-G. / Kobayashi, T.

Published in:

Designing, Processing and Properties of Advanced Engineering Materials PART 2 ; 997-1000

MATERIALS SCIENCE FORUM ; 449/452

Publication date:

2004-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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