Ruthenium disulfide thin films prepared by the successive ionic layer adsorption and reaction (SILAR) method: Fid-Bau Portal

Ruthenium disulfide thin films prepared by the successive ionic layer adsorption and reaction (SILAR) method

Liu, X. / Jin, Z. / Zhao, J. / Bu, S.

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Ruthenium disulfide thin films prepared by the successive ionic layer adsorption and reaction (SILAR) method

Liu, X. / Jin, Z. / Zhao, J. / Bu, S.

Ruthenium disulfide thin films prepared by the successive ionic layer adsorption and reaction (SILAR) method

Liu, X. / Jin, Z. / Zhao, J. / Bu, S.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Ruthenium disulfide thin films prepared by the successive ionic layer adsorption and reaction (SILAR) method

Contributors:

Liu, X. (author) / Jin, Z. (author) / Zhao, J. (author) / Bu, S. (author)

Published in:

RARE METALS -BEIJING- ENGLISH EDITION ; 23 ; 93-96

Publication date:

2004-01-01

Size:

4 pages

ISSN:

1001-0521

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 669

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