Leakage current behavior of La-doped Bi2Ti2O7 thin films by a chemical solution deposition method: Fid-Bau Portal

Leakage current behavior of La-doped Bi2Ti2O7 thin films by a chemical solution deposition method

Yang, X. / Huang, B. / Wang, H. / Shang, S. / Yao, W. / Wei, J.

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Leakage current behavior of La-doped Bi2Ti2O7 thin films by a chemical solution deposition method

Yang, X. / Huang, B. / Wang, H. / Shang, S. / Yao, W. / Wei, J.

Leakage current behavior of La-doped Bi2Ti2O7 thin films by a chemical solution deposition method

Yang, X. / Huang, B. / Wang, H. / Shang, S. / Yao, W. / Wei, J.

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Check availability in my library

Order at Subito €

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Document information

Title:

Leakage current behavior of La-doped Bi2Ti2O7 thin films by a chemical solution deposition method

Contributors:

Yang, X. (author) / Huang, B. (author) / Wang, H. (author) / Shang, S. (author) / Yao, W. (author) / Wei, J. (author)

Published in:

MATERIALS LETTERS ; 58 ; 3725-3728

Publication date:

2004-01-01

Size:

4 pages

ISSN:

0167-577X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1105 / 530

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