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Characterization of (Ti, Al)N films prepared by ion mixing and vapor deposition

Uchida, H. / Yamashita, M. / Hanaki, S. / Ueta, T.

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Characterization of (Ti, Al)N films prepared by ion mixing and vapor deposition

Uchida, H. / Yamashita, M. / Hanaki, S. / Ueta, T.

Characterization of (Ti, Al)N films prepared by ion mixing and vapor deposition

Uchida, H. / Yamashita, M. / Hanaki, S. / Ueta, T.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Characterization of (Ti, Al)N films prepared by ion mixing and vapor deposition

Contributors:

Uchida, H. (author) / Yamashita, M. (author) / Hanaki, S. (author) / Ueta, T. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING A ; 387/389 ; 758-762

Publication date:

2004-01-01

Size:

5 pages

ISSN:

0921-5093

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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