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The critical layer number of epitaxially grown Cu and Ni films with strained structure

Li, J. C. / Liu, W. / Jiang, Q.

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The critical layer number of epitaxially grown Cu and Ni films with strained structure

Li, J. C. / Liu, W. / Jiang, Q.

The critical layer number of epitaxially grown Cu and Ni films with strained structure

Li, J. C. / Liu, W. / Jiang, Q.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

The critical layer number of epitaxially grown Cu and Ni films with strained structure

Contributors:

Li, J. C. (author) / Liu, W. (author) / Jiang, Q. (author)

Published in:

APPLIED SURFACE SCIENCE ; 239 ; 259-261

Publication date:

2005-01-01

Size:

3 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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