Growth of Single Crystals and Low Temperature Oxidation Behaviors of MoSi~2 and NbSi~2: Fid-Bau Portal

Growth of Single Crystals and Low Temperature Oxidation Behaviors of MoSi~2 and NbSi~2

Zhang, F. / Zhang, L. / Yu, J. / Wu, J.

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Growth of Single Crystals and Low Temperature Oxidation Behaviors of MoSi~2 and NbSi~2

Zhang, F. / Zhang, L. / Yu, J. / Wu, J.

Growth of Single Crystals and Low Temperature Oxidation Behaviors of MoSi~2 and NbSi~2

Zhang, F. / Zhang, L. / Yu, J. / Wu, J.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Growth of Single Crystals and Low Temperature Oxidation Behaviors of MoSi~2 and NbSi~2

Contributors:

Zhang, F. (author) / Zhang, L. (author) / Yu, J. (author) / Wu, J. (author)

Published in:

MATERIALS SCIENCE FORUM ; 475/479 ; 729-732

Publication date:

2005-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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