MOCVD Growth and Annealing of Gallium Oxide Thin Film and Its Structural Characterization: Fid-Bau Portal

MOCVD Growth and Annealing of Gallium Oxide Thin Film and Its Structural Characterization

Kim, N. H. / Kim, H. W.

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MOCVD Growth and Annealing of Gallium Oxide Thin Film and Its Structural Characterization

Kim, N. H. / Kim, H. W.

MOCVD Growth and Annealing of Gallium Oxide Thin Film and Its Structural Characterization

Kim, N. H. / Kim, H. W.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

MOCVD Growth and Annealing of Gallium Oxide Thin Film and Its Structural Characterization

Contributors:

Kim, N. H. (author) / Kim, H. W. (author)

Published in:

MATERIALS SCIENCE FORUM ; 475/479 ; 3377-3380

Publication date:

2005-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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