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Growth of thick AlGaN by mixed-source hydride vapor phase epitaxy

Ahn, H. S. / Kim, K. H. / Yang, M. / Yi, J. Y. / Lee, H. J. / Cho, C. R. / Cho, H. K. / Kim, S. W. / Narita, T. / Honda, Y.

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Growth of thick AlGaN by mixed-source hydride vapor phase epitaxy

Ahn, H. S. / Kim, K. H. / Yang, M. / Yi, J. Y. / Lee, H. J. / Cho, C. R. / Cho, H. K. / Kim, S. W. / Narita, T. / Honda, Y.

Growth of thick AlGaN by mixed-source hydride vapor phase epitaxy

Ahn, H. S. / Kim, K. H. / Yang, M. / Yi, J. Y. / Lee, H. J. / Cho, C. R. / Cho, H. K. / Kim, S. W. / Narita, T. / Honda, Y.

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Document information

Title:

Growth of thick AlGaN by mixed-source hydride vapor phase epitaxy

Contributors:

Ahn, H. S. (author) / Kim, K. H. (author) / Yang, M. (author) / Yi, J. Y. (author) / Lee, H. J. (author) / Cho, C. R. (author) / Cho, H. K. (author) / Kim, S. W. (author) / Narita, T. (author) / Honda, Y. (author)

Published in:

APPLIED SURFACE SCIENCE ; 243 ; 180-184

Publication date:

2005-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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