Preparation and characterization of Rhodamine B and Alq3 thin films deposited by solution jet beam method: Fid-Bau Portal

Preparation and characterization of Rhodamine B and Alq3 thin films deposited by solution jet beam method

Okabayashi, Y. / Mitarai, T. / Yamazaki, S. / Matsuyama, R. / Kanai, K. / Ouchi, Y. / Seki, K.

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Preparation and characterization of Rhodamine B and Alq3 thin films deposited by solution jet beam method

Okabayashi, Y. / Mitarai, T. / Yamazaki, S. / Matsuyama, R. / Kanai, K. / Ouchi, Y. / Seki, K.

Preparation and characterization of Rhodamine B and Alq3 thin films deposited by solution jet beam method

Okabayashi, Y. / Mitarai, T. / Yamazaki, S. / Matsuyama, R. / Kanai, K. / Ouchi, Y. / Seki, K.

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Document information

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Document information

Title:

Preparation and characterization of Rhodamine B and Alq3 thin films deposited by solution jet beam method

Contributors:

Okabayashi, Y. (author) / Mitarai, T. (author) / Yamazaki, S. (author) / Matsuyama, R. (author) / Kanai, K. (author) / Ouchi, Y. (author) / Seki, K. (author)

Published in:

APPLIED SURFACE SCIENCE ; 244 ; 217-220

Publication date:

2005-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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