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    Air oxidation behavior of nitrogen ion implanted zircaloy-4 at 500 °C

    New search for: Wan, Q.
    New search for: Bai, X.
    New search for: Liu, X.

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    Air oxidation behavior of nitrogen ion implanted zircaloy-4 at 500 °C

    New search for: Wan, Q.
    New search for: Bai, X.
    New search for: Liu, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Air oxidation behavior of nitrogen ion implanted zircaloy-4 at 500 °C

    New search for: Wan, Q.
    New search for: Bai, X.
    New search for: Liu, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Air oxidation behavior of nitrogen ion implanted zircaloy-4 at 500 °C

    Contributors:

    Wan, Q. (author) / Bai, X. (author) / Liu, X. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE ; 40 ; 5541-5544

    Publication date:

    2005-01-01

    Size:

    4 pages

    ISSN:

    0022-2461

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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