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The use of titanium and titanium dioxide as masks for deep silicon etching

Powell, O. / Sweatman, D. / Harrison, H. B.

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The use of titanium and titanium dioxide as masks for deep silicon etching

Powell, O. / Sweatman, D. / Harrison, H. B.

The use of titanium and titanium dioxide as masks for deep silicon etching

Powell, O. / Sweatman, D. / Harrison, H. B.

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Check availability in my library

Order at Subito €

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Document information

Title:

The use of titanium and titanium dioxide as masks for deep silicon etching

Contributors:

Powell, O. (author) / Sweatman, D. (author) / Harrison, H. B. (author)

Published in:

SMART MATERIALS AND STRUCTURES ; 15 ; S81-S86

Publication date:

2006-01-01

Size:

S81-S86

ISSN:

0964-1726

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 530

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