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    Study on EDM Polishing of CVD Diamond Films

    New search for: Lu, W. Z.
    New search for: Zuo, D. W.
    New search for: Wang, M.
    New search for: Xu, F.
    New search for: Li, X. F.
    New search for: Yuan, Z.
    New search for: Xu, X.
    New search for: Zuo, D.
    New search for: Yuan, J.
    New search for: Yao, Y.

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    Study on EDM Polishing of CVD Diamond Films

    New search for: Lu, W. Z.
    New search for: Zuo, D. W.
    New search for: Wang, M.
    New search for: Xu, F.
    New search for: Li, X. F.
    New search for: Yuan, Z.
    New search for: Xu, X.
    New search for: Zuo, D.
    New search for: Yuan, J.
    New search for: Yao, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Study on EDM Polishing of CVD Diamond Films

    New search for: Lu, W. Z.
    New search for: Zuo, D. W.
    New search for: Wang, M.
    New search for: Xu, F.
    New search for: Li, X. F.
    New search for: Yuan, Z.
    New search for: Xu, X.
    New search for: Zuo, D.
    New search for: Yuan, J.
    New search for: Yao, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Study on EDM Polishing of CVD Diamond Films

    Contributors:

    Lu, W. Z. (author) / Zuo, D. W. (author) / Wang, M. (author) / Xu, F. (author) / Li, X. F. (author) / Yuan, Z. / Xu, X. / Zuo, D. / Yuan, J. / Yao, Y.

    Published in:

    Advances in Machining & Manufacturing Technology VIII ; 464-468

    KEY ENGINEERING MATERIALS ; 315/316

    Publication date:

    2006-01-01

    Size:

    5 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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