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    A New Magnetic Polishing Liquid (MPL) for Precision Surface Finishing

    New search for: Jiang, J.
    New search for: Wu, Y. B.
    New search for: Wang, X. Y.
    New search for: Kato, M.
    New search for: Yuan, Z.
    New search for: Xu, X.
    New search for: Zuo, D.
    New search for: Yuan, J.
    New search for: Yao, Y.

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    A New Magnetic Polishing Liquid (MPL) for Precision Surface Finishing

    New search for: Jiang, J.
    New search for: Wu, Y. B.
    New search for: Wang, X. Y.
    New search for: Kato, M.
    New search for: Yuan, Z.
    New search for: Xu, X.
    New search for: Zuo, D.
    New search for: Yuan, J.
    New search for: Yao, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    A New Magnetic Polishing Liquid (MPL) for Precision Surface Finishing

    New search for: Jiang, J.
    New search for: Wu, Y. B.
    New search for: Wang, X. Y.
    New search for: Kato, M.
    New search for: Yuan, Z.
    New search for: Xu, X.
    New search for: Zuo, D.
    New search for: Yuan, J.
    New search for: Yao, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    A New Magnetic Polishing Liquid (MPL) for Precision Surface Finishing

    Contributors:

    Jiang, J. (author) / Wu, Y. B. (author) / Wang, X. Y. (author) / Kato, M. (author) / Yuan, Z. / Xu, X. / Zuo, D. / Yuan, J. / Yao, Y.

    Published in:

    Advances in Machining & Manufacturing Technology VIII ; 671-675

    KEY ENGINEERING MATERIALS ; 315/316

    Publication date:

    2006-01-01

    Size:

    5 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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