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    Simulations of the Dependence of Gas Physical Parameters on Deposition Variables during HFCVD Diamond Films

    New search for: Wang, A.
    New search for: Lee, K.
    New search for: Sun, C.
    New search for: Wen, L.

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    Simulations of the Dependence of Gas Physical Parameters on Deposition Variables during HFCVD Diamond Films

    New search for: Wang, A.
    New search for: Lee, K.
    New search for: Sun, C.
    New search for: Wen, L.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Simulations of the Dependence of Gas Physical Parameters on Deposition Variables during HFCVD Diamond Films

    New search for: Wang, A.
    New search for: Lee, K.
    New search for: Sun, C.
    New search for: Wen, L.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Simulations of the Dependence of Gas Physical Parameters on Deposition Variables during HFCVD Diamond Films

    Contributors:

    Wang, A. (author) / Lee, K. (author) / Sun, C. (author) / Wen, L. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE AND TECHNOLOGY -SHENYANG- ; 22 ; 599-604

    Publication date:

    2006-01-01

    Size:

    6 pages

    ISSN:

    1005-0302

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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