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Anelasticity study on electromigration effect in Cu thin films
Anelasticity study on electromigration effect in Cu thin films
Anelasticity study on electromigration effect in Cu thin films
Mizubayashi, H. (author) / Goto, K. (author) / Ebisawa, T. (author) / Tanimoto, H. (author)
MATERIALS SCIENCE AND ENGINEERING A ; 442 ; 342-346
2006-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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