Erratum to "Formation of photoresist-free patterned ZnO film containing nano-sized Ag by photochemical solution deposition" [Appl. Surf. Sci. 252 (2006) 7739-7742]: Fid-Bau Portal

Erratum to "Formation of photoresist-free patterned ZnO film containing nano-sized Ag by photochemical solution deposition" [Appl. Surf. Sci. 252 (2006) 7739-7742]

Hong, C. S. / Park, H. H. / Wang, S. J. / Moon, J. / Hill, R. H.

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Erratum to "Formation of photoresist-free patterned ZnO film containing nano-sized Ag by photochemical solution deposition" [Appl. Surf. Sci. 252 (2006) 7739-7742]

Hong, C. S. / Park, H. H. / Wang, S. J. / Moon, J. / Hill, R. H.

Erratum to "Formation of photoresist-free patterned ZnO film containing nano-sized Ag by photochemical solution deposition" [Appl. Surf. Sci. 252 (2006) 7739-7742]

Hong, C. S. / Park, H. H. / Wang, S. J. / Moon, J. / Hill, R. H.

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Document information

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Document information

Title:

Erratum to "Formation of photoresist-free patterned ZnO film containing nano-sized Ag by photochemical solution deposition" [Appl. Surf. Sci. 252 (2006) 7739-7742]

Contributors:

Hong, C. S. (author) / Park, H. H. (author) / Wang, S. J. (author) / Moon, J. (author) / Hill, R. H. (author)

Published in:

APPLIED SURFACE SCIENCE ; 253 ; 2355

Publication date:

2006-01-01

Size:

2355 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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