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Properties of zinc oxide thin films prepared on silicon (100) and glass substrates by pulsed laser deposition technique with different oxygen gas pressures
Properties of zinc oxide thin films prepared on silicon (100) and glass substrates by pulsed laser deposition technique with different oxygen gas pressures
Properties of zinc oxide thin films prepared on silicon (100) and glass substrates by pulsed laser deposition technique with different oxygen gas pressures
SURFACE ENGINEERING -LONDON- ; 23 ; 68-72
2007-01-01
5 pages
Article (Journal)
English
DDC:
620.44
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