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Work function control at metal-oxide interfaces in CMOS
Work function control at metal-oxide interfaces in CMOS
Work function control at metal-oxide interfaces in CMOS
Tse, K. (author) / Robertson, J. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 9 ; 964-968
2006-01-01
5 pages
Article (Journal)
English
DDC:
621.38152
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