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    Fabrication of SiCN MEMS by UV Lithography of Polysilazane

    New search for: Wang, H. T.
    New search for: Xie, Z. P.
    New search for: Yang, W. Y.
    New search for: Liu, G. Q.
    New search for: An, L. N.
    New search for: Pan, W.
    New search for: Gong, J.

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    Fabrication of SiCN MEMS by UV Lithography of Polysilazane

    New search for: Wang, H. T.
    New search for: Xie, Z. P.
    New search for: Yang, W. Y.
    New search for: Liu, G. Q.
    New search for: An, L. N.
    New search for: Pan, W.
    New search for: Gong, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Fabrication of SiCN MEMS by UV Lithography of Polysilazane

    New search for: Wang, H. T.
    New search for: Xie, Z. P.
    New search for: Yang, W. Y.
    New search for: Liu, G. Q.
    New search for: An, L. N.
    New search for: Pan, W.
    New search for: Gong, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
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    Document information
    Title:

    Fabrication of SiCN MEMS by UV Lithography of Polysilazane

    Contributors:

    Wang, H. T. (author) / Xie, Z. P. (author) / Yang, W. Y. (author) / Liu, G. Q. (author) / An, L. N. (author) / Pan, W. / Gong, J.

    Published in:

    Proceedings of the Fourth China International Conference on High-Performance Ceramics (CICC-4) (Incorporating the Second International Workshop on Layered and Graded Materials and the First Satellite Symposium on Thermoelectrics) Chengdu, China, October 23 ∼ 26, 2005 ; 1477-1480

    KEY ENGINEERING MATERIALS ; 336/338

    Publication date:

    2007-01-01

    Size:

    4 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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