Effect of Oxygen Partial Pressure on Structure and Dielectric Property of BaTi~2O~5 Films Prepared by Laser Ablation: Fid-Bau Portal

Effect of Oxygen Partial Pressure on Structure and Dielectric Property of BaTi~2O~5 Films Prepared by Laser Ablation

Wang, C. / Tu, R. / Goto, T.

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Effect of Oxygen Partial Pressure on Structure and Dielectric Property of BaTi~2O~5 Films Prepared by Laser Ablation

Wang, C. / Tu, R. / Goto, T.

Effect of Oxygen Partial Pressure on Structure and Dielectric Property of BaTi~2O~5 Films Prepared by Laser Ablation

Wang, C. / Tu, R. / Goto, T.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Effect of Oxygen Partial Pressure on Structure and Dielectric Property of BaTi~2O~5 Films Prepared by Laser Ablation

Contributors:

Wang, C. (author) / Tu, R. (author) / Goto, T. (author)

Published in:

MATERIALS TRANSACTIONS ; 48 ; 625-628

Publication date:

2007-01-01

Size:

4 pages

ISSN:

1345-9678

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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