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    Fabrication of Highly Conductive Poly(3,4-ethylenedioxythiophene) Films by Vapor Phase Polymerization and Their Application in Efficient Organic Light-Emitting Diodes

    New search for: Levermore, P. A.
    New search for: Chen, L.
    New search for: Wang, X.
    New search for: Das, R.
    New search for: Bradley, D. D.

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    Fabrication of Highly Conductive Poly(3,4-ethylenedioxythiophene) Films by Vapor Phase Polymerization and Their Application in Efficient Organic Light-Emitting Diodes

    New search for: Levermore, P. A.
    New search for: Chen, L.
    New search for: Wang, X.
    New search for: Das, R.
    New search for: Bradley, D. D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Fabrication of Highly Conductive Poly(3,4-ethylenedioxythiophene) Films by Vapor Phase Polymerization and Their Application in Efficient Organic Light-Emitting Diodes

    New search for: Levermore, P. A.
    New search for: Chen, L.
    New search for: Wang, X.
    New search for: Das, R.
    New search for: Bradley, D. D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Fabrication of Highly Conductive Poly(3,4-ethylenedioxythiophene) Films by Vapor Phase Polymerization and Their Application in Efficient Organic Light-Emitting Diodes

    Contributors:

    Levermore, P. A. (author) / Chen, L. (author) / Wang, X. (author) / Das, R. (author) / Bradley, D. D. (author)

    Published in:

    ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 19 ; 2379-2385

    Publication date:

    2007-01-01

    Size:

    7 pages

    ISSN:

    0935-9648

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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