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Topographic control on silicone surface using chemical oxidization method

Shih, T. K. / Ho, J. R. / Chen, C. F. / Whang, W. T. / Chen, C. C.

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Topographic control on silicone surface using chemical oxidization method

Shih, T. K. / Ho, J. R. / Chen, C. F. / Whang, W. T. / Chen, C. C.

Topographic control on silicone surface using chemical oxidization method

Shih, T. K. / Ho, J. R. / Chen, C. F. / Whang, W. T. / Chen, C. C.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Topographic control on silicone surface using chemical oxidization method

Contributors:

Shih, T. K. (author) / Ho, J. R. (author) / Chen, C. F. (author) / Whang, W. T. (author) / Chen, C. C. (author)

Published in:

APPLIED SURFACE SCIENCE ; 253 ; 9381-9386

Publication date:

2007-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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