Chalcopyrite leaching at ambient temperature with oxidants and mechanism investigation: Fid-Bau Portal

Chalcopyrite leaching at ambient temperature with oxidants and mechanism investigation

Jiang, X.-h. / Lu, Y.-p. / Feng, Q.-m.

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Chalcopyrite leaching at ambient temperature with oxidants and mechanism investigation

Jiang, X.-h. / Lu, Y.-p. / Feng, Q.-m.

Chalcopyrite leaching at ambient temperature with oxidants and mechanism investigation

Jiang, X.-h. / Lu, Y.-p. / Feng, Q.-m.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Chalcopyrite leaching at ambient temperature with oxidants and mechanism investigation

Contributors:

Jiang, X.-h. (author) / Lu, Y.-p. (author) / Feng, Q.-m. (author)

Published in:

NONFERROUS METALS -BEIJING- ; 60 ; 62-66

Publication date:

2008-01-01

Size:

5 pages

ISSN:

1001-0211

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 669

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