Electromechanical properties of nichrome (80/20 wt-%) thin film fabricated by low energy ion sputtering: Fid-Bau Portal

Electromechanical properties of nichrome (80/20 wt-%) thin film fabricated by low energy ion sputtering

Yan, J.W. / Zhou, J.C. / Zhang, C.S. / Yi, Y.

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Electromechanical properties of nichrome (80/20 wt-%) thin film fabricated by low energy ion sputtering

Yan, J.W. / Zhou, J.C. / Zhang, C.S. / Yi, Y.

Electromechanical properties of nichrome (80/20 wt-%) thin film fabricated by low energy ion sputtering

Yan, J.W. / Zhou, J.C. / Zhang, C.S. / Yi, Y.

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Document information

Title:

Electromechanical properties of nichrome (80/20 wt-%) thin film fabricated by low energy ion sputtering

Contributors:

Yan, J.W. (author) / Zhou, J.C. (author) / Zhang, C.S. (author) / Yi, Y. (author)

Published in:

SURFACE ENGINEERING -LONDON- ; 24 ; 230-235

Publication date:

2008-01-01

Size:

6 pages

ISSN:

0267-0844

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.44

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