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Photo-embossed Surface Relief Structures with an Increased Aspect Ratios by Addition of a Reversible Addition-Fragmentation Chain Transfer Agent
Photo-embossed Surface Relief Structures with an Increased Aspect Ratios by Addition of a Reversible Addition-Fragmentation Chain Transfer Agent
Photo-embossed Surface Relief Structures with an Increased Aspect Ratios by Addition of a Reversible Addition-Fragmentation Chain Transfer Agent
Perelaer, J. (author) / Hermans, K. (author) / Bastiaansen, C. W. (author) / Broer, D. J. (author) / Schubert, U. S. (author)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 20 ; 3117-3121
2008-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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