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    Deposition process, microstructure and mechanical behaviours of RF magnetron sputtered (Ti,Al)N thin films

    New search for: Yang, H.S.
    New search for: Lu, Y.H.
    New search for: He, X.
    New search for: Xiong, X.T.
    New search for: Qiao, L.J.
    New search for: Wang, Y.B.

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    Deposition process, microstructure and mechanical behaviours of RF magnetron sputtered (Ti,Al)N thin films

    New search for: Yang, H.S.
    New search for: Lu, Y.H.
    New search for: He, X.
    New search for: Xiong, X.T.
    New search for: Qiao, L.J.
    New search for: Wang, Y.B.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Deposition process, microstructure and mechanical behaviours of RF magnetron sputtered (Ti,Al)N thin films

    New search for: Yang, H.S.
    New search for: Lu, Y.H.
    New search for: He, X.
    New search for: Xiong, X.T.
    New search for: Qiao, L.J.
    New search for: Wang, Y.B.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Deposition process, microstructure and mechanical behaviours of RF magnetron sputtered (Ti,Al)N thin films

    Contributors:

    Yang, H.S. (author) / Lu, Y.H. (author) / He, X. (author) / Xiong, X.T. (author) / Qiao, L.J. (author) / Wang, Y.B. (author)

    Published in:

    MATERIALS SCIENCE AND TECHNOLOGY -LONDON- ; 24 ; 1299-1303

    Publication date:

    2008-01-01

    Size:

    5 pages

    ISSN:

    0267-0836

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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