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    A New Route of Forming Silicon Carbide Nanostructures with Controlled Morphologies

    New search for: Cheng, Y.B.
    New search for: Wang, K.
    New search for: Wang, H.T.
    New search for: Komeya, K.
    New search for: Cheng, Y.-B.
    New search for: Tatami, J.
    New search for: Mitomo, M.

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    A New Route of Forming Silicon Carbide Nanostructures with Controlled Morphologies

    New search for: Cheng, Y.B.
    New search for: Wang, K.
    New search for: Wang, H.T.
    New search for: Komeya, K.
    New search for: Cheng, Y.-B.
    New search for: Tatami, J.
    New search for: Mitomo, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    A New Route of Forming Silicon Carbide Nanostructures with Controlled Morphologies

    New search for: Cheng, Y.B.
    New search for: Wang, K.
    New search for: Wang, H.T.
    New search for: Komeya, K.
    New search for: Cheng, Y.-B.
    New search for: Tatami, J.
    New search for: Mitomo, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    A New Route of Forming Silicon Carbide Nanostructures with Controlled Morphologies

    Contributors:

    Cheng, Y.B. (author) / Wang, K. (author) / Wang, H.T. (author) / Komeya, K. / Cheng, Y.-B. / Tatami, J. / Mitomo, M.

    Published in:

    SiAlONs and Non-oxides Selected, peer reviewed papers from the 2nd International Symposium on SiAlONs and Non-oxides, December 2nd - 5th, 2007 Ise-shima Royal Hotel, Mie, Japan ; 149-152

    KEY ENGINEERING MATERIALS ; 403

    Publication date:

    2009-01-01

    Size:

    4 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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