Structural and electrical transport properties of Nb-doped TiO2 films deposited on LaAlO3 by rf sputtering: Fid-Bau Portal

Structural and electrical transport properties of Nb-doped TiO2 films deposited on LaAlO3 by rf sputtering

Zheng, X. W. / Li, Z. Q.

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Structural and electrical transport properties of Nb-doped TiO2 films deposited on LaAlO3 by rf sputtering

Zheng, X. W. / Li, Z. Q.

Structural and electrical transport properties of Nb-doped TiO2 films deposited on LaAlO3 by rf sputtering

Zheng, X. W. / Li, Z. Q.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Structural and electrical transport properties of Nb-doped TiO2 films deposited on LaAlO3 by rf sputtering

Contributors:

Zheng, X. W. (author) / Li, Z. Q. (author)

Published in:

APPLIED SURFACE SCIENCE ; 255 ; 8104-8109

Publication date:

2009-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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