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Stress induced preferred orientation and phase transition for ternary WCxNy thin films

Su, Y. D. / Hu, C. Q. / Wang, C. / Wen, M. / Liu, D. S. / Zheng, W. T.

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Stress induced preferred orientation and phase transition for ternary WCxNy thin films

Su, Y. D. / Hu, C. Q. / Wang, C. / Wen, M. / Liu, D. S. / Zheng, W. T.

Stress induced preferred orientation and phase transition for ternary WCxNy thin films

Su, Y. D. / Hu, C. Q. / Wang, C. / Wen, M. / Liu, D. S. / Zheng, W. T.

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Check availability in my library

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Document information

Title:

Stress induced preferred orientation and phase transition for ternary WCxNy thin films

Contributors:

Su, Y. D. (author) / Hu, C. Q. (author) / Wang, C. (author) / Wen, M. (author) / Liu, D. S. (author) / Zheng, W. T. (author)

Published in:

APPLIED SURFACE SCIENCE ; 255 ; 8164-8170

Publication date:

2009-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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