Influence of oxygen growth pressure on laser ablated Cr-doped In2O3 thin films: Fid-Bau Portal

Influence of oxygen growth pressure on laser ablated Cr-doped In2O3 thin films

Ukah, N. B. / Gupta, R. K. / Kahol, P. K. / Ghosh, K.

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Influence of oxygen growth pressure on laser ablated Cr-doped In2O3 thin films

Ukah, N. B. / Gupta, R. K. / Kahol, P. K. / Ghosh, K.

Influence of oxygen growth pressure on laser ablated Cr-doped In2O3 thin films

Ukah, N. B. / Gupta, R. K. / Kahol, P. K. / Ghosh, K.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Influence of oxygen growth pressure on laser ablated Cr-doped In2O3 thin films

Contributors:

Ukah, N. B. (author) / Gupta, R. K. (author) / Kahol, P. K. (author) / Ghosh, K. (author)

Published in:

APPLIED SURFACE SCIENCE ; 255 ; 9420-9424

Publication date:

2009-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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