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    Electrophoretic Deposition as Preparation Method for Intermediate Temperature SOFC Half Cells

    New search for: Szepanski, C.
    New search for: Grosse-Brauckmann, J.
    New search for: Argirusis, C.
    New search for: Boccaccini, A.R.
    New search for: Van der Biest, O.
    New search for: Clasen, R.
    New search for: Uchikoshi, T.

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    Electrophoretic Deposition as Preparation Method for Intermediate Temperature SOFC Half Cells

    New search for: Szepanski, C.
    New search for: Grosse-Brauckmann, J.
    New search for: Argirusis, C.
    New search for: Boccaccini, A.R.
    New search for: Van der Biest, O.
    New search for: Clasen, R.
    New search for: Uchikoshi, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Electrophoretic Deposition as Preparation Method for Intermediate Temperature SOFC Half Cells

    New search for: Szepanski, C.
    New search for: Grosse-Brauckmann, J.
    New search for: Argirusis, C.
    New search for: Boccaccini, A.R.
    New search for: Van der Biest, O.
    New search for: Clasen, R.
    New search for: Uchikoshi, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Electrophoretic Deposition as Preparation Method for Intermediate Temperature SOFC Half Cells

    Contributors:

    Szepanski, C. (author) / Grosse-Brauckmann, J. (author) / Argirusis, C. (author) / Boccaccini, A.R. / Van der Biest, O. / Clasen, R. / Uchikoshi, T.

    Published in:

    Electrophoretic Deposition: Fundamentals and Applications III ; 209-214

    KEY ENGINEERING MATERIALS ; 412

    Publication date:

    2009-01-01

    Size:

    6 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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