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    Cluster size dependence of SiO2 thin film formation by O2 gas cluster ion beams

    New search for: Mashita, T.
    New search for: Toyoda, N.
    New search for: Yamada, I.

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    Cluster size dependence of SiO2 thin film formation by O2 gas cluster ion beams

    New search for: Mashita, T.
    New search for: Toyoda, N.
    New search for: Yamada, I.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Cluster size dependence of SiO2 thin film formation by O2 gas cluster ion beams

    New search for: Mashita, T.
    New search for: Toyoda, N.
    New search for: Yamada, I.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Cluster size dependence of SiO2 thin film formation by O2 gas cluster ion beams

    Contributors:

    Mashita, T. (author) / Toyoda, N. (author) / Yamada, I. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 256 ; 1106-1109

    Publication date:

    2009-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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