Dependence of reaction pressure on deposition and properties of boron-doped freestanding diamond films: Fid-Bau Portal

Dependence of reaction pressure on deposition and properties of boron-doped freestanding diamond films

Li, L. / Li, H. / Lu, X. / Cheng, S. / Wang, Q. / Ren, S. / Liu, J. / Zou, G.

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Dependence of reaction pressure on deposition and properties of boron-doped freestanding diamond films

Li, L. / Li, H. / Lu, X. / Cheng, S. / Wang, Q. / Ren, S. / Liu, J. / Zou, G.

Dependence of reaction pressure on deposition and properties of boron-doped freestanding diamond films

Li, L. / Li, H. / Lu, X. / Cheng, S. / Wang, Q. / Ren, S. / Liu, J. / Zou, G.

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Document information

Title:

Dependence of reaction pressure on deposition and properties of boron-doped freestanding diamond films

Contributors:

Li, L. (author) / Li, H. (author) / Lu, X. (author) / Cheng, S. (author) / Wang, Q. (author) / Ren, S. (author) / Liu, J. (author) / Zou, G. (author)

Published in:

APPLIED SURFACE SCIENCE ; 256 ; 1764-1768

Publication date:

2010-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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