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Generation and removal of pits during chemical mechanical polishing process for MgO single crystal substrate
Generation and removal of pits during chemical mechanical polishing process for MgO single crystal substrate
Generation and removal of pits during chemical mechanical polishing process for MgO single crystal substrate
Wang, K. (author) / Li, Y. Z. (author) / Kang, R. K. (author) / Guo, D. M. (author)
APPLIED SURFACE SCIENCE ; 256 ; 2691-2699
2010-01-01
9 pages
Article (Journal)
English
DDC:
621.35
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