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    Ductility of Thin Metallic Films

    New search for: Pardoen, T.
    New search for: Coulombier, M.
    New search for: Boe, A.
    New search for: Safi, A.
    New search for: Brugger, C.
    New search for: Ryelandt, S.
    New search for: Carbonnelle, P.
    New search for: Gravier, S.
    New search for: Raskin, J.
    New search for: Zhao, Y.
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    Ductility of Thin Metallic Films

    New search for: Pardoen, T.
    New search for: Coulombier, M.
    New search for: Boe, A.
    New search for: Safi, A.
    New search for: Brugger, C.
    New search for: Ryelandt, S.
    New search for: Carbonnelle, P.
    New search for: Gravier, S.
    New search for: Raskin, J.
    New search for: Zhao, Y.
    New search for: Liao, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Ductility of Thin Metallic Films

    New search for: Pardoen, T.
    New search for: Coulombier, M.
    New search for: Boe, A.
    New search for: Safi, A.
    New search for: Brugger, C.
    New search for: Ryelandt, S.
    New search for: Carbonnelle, P.
    New search for: Gravier, S.
    New search for: Raskin, J.
    New search for: Zhao, Y.
    New search for: Liao, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
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    Document information
    Title:

    Ductility of Thin Metallic Films

    Contributors:

    Pardoen, T. (author) / Coulombier, M. (author) / Boe, A. (author) / Safi, A. (author) / Brugger, C. (author) / Ryelandt, S. (author) / Carbonnelle, P. (author) / Gravier, S. (author) / Raskin, J. (author) / Zhao, Y.

    Published in:

    Ductility of Bulk Nanostructured Materials ; 615-636

    MATERIALS SCIENCE FORUM ; 633/634

    Publication date:

    2010-01-01

    Size:

    22 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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