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    A simple pathway to ordered silica nanopattern from self-assembling of block copolymer containing organic silicon block

    New search for: Wang, Q.
    New search for: Yang, J.
    New search for: Yao, W.
    New search for: Wang, K.
    New search for: Du, R.
    New search for: Zhang, Q.
    New search for: Chen, F.
    New search for: Fu, Q.

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    A simple pathway to ordered silica nanopattern from self-assembling of block copolymer containing organic silicon block

    New search for: Wang, Q.
    New search for: Yang, J.
    New search for: Yao, W.
    New search for: Wang, K.
    New search for: Du, R.
    New search for: Zhang, Q.
    New search for: Chen, F.
    New search for: Fu, Q.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    A simple pathway to ordered silica nanopattern from self-assembling of block copolymer containing organic silicon block

    New search for: Wang, Q.
    New search for: Yang, J.
    New search for: Yao, W.
    New search for: Wang, K.
    New search for: Du, R.
    New search for: Zhang, Q.
    New search for: Chen, F.
    New search for: Fu, Q.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    A simple pathway to ordered silica nanopattern from self-assembling of block copolymer containing organic silicon block

    Contributors:

    Wang, Q. (author) / Yang, J. (author) / Yao, W. (author) / Wang, K. (author) / Du, R. (author) / Zhang, Q. (author) / Chen, F. (author) / Fu, Q. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 256 ; 5843-5848

    Publication date:

    2010-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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