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    Evaluation of the Structures and Oxidation Resistances of MoSi~2-Si Composite Thin Films

    New search for: Hayashi, T.
    New search for: Sato, Y.
    New search for: Yoshikado, S.
    New search for: Fujihara, S.
    New search for: Takenaka, T.

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    Evaluation of the Structures and Oxidation Resistances of MoSi~2-Si Composite Thin Films

    New search for: Hayashi, T.
    New search for: Sato, Y.
    New search for: Yoshikado, S.
    New search for: Fujihara, S.
    New search for: Takenaka, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Evaluation of the Structures and Oxidation Resistances of MoSi~2-Si Composite Thin Films

    New search for: Hayashi, T.
    New search for: Sato, Y.
    New search for: Yoshikado, S.
    New search for: Fujihara, S.
    New search for: Takenaka, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Document information
    Title:

    Evaluation of the Structures and Oxidation Resistances of MoSi~2-Si Composite Thin Films

    Contributors:

    Hayashi, T. (author) / Sato, Y. (author) / Yoshikado, S. (author) / Fujihara, S. / Takenaka, T.

    Published in:

    Electroceramics in Japan XIII Selected, peer reviewed papers from the 29th Electronics Division Meeting of the Ceramic Society of Japan, Tokyo, Japan, October 23-24, 2009 ; 148-151

    KEY ENGINEERING MATERIALS ; 445

    Publication date:

    2010-01-01

    Size:

    4 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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