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    Dopant passivation and work function tuning through attachment of heterogeneous organic monolayers on silicon in ultrahigh vacuum

    New search for: Cooper, A. J.
    New search for: Keyvanfar, K.
    New search for: Deberardinis, A.
    New search for: Pu, L.
    New search for: Bean, J. C.

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    Dopant passivation and work function tuning through attachment of heterogeneous organic monolayers on silicon in ultrahigh vacuum

    New search for: Cooper, A. J.
    New search for: Keyvanfar, K.
    New search for: Deberardinis, A.
    New search for: Pu, L.
    New search for: Bean, J. C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Dopant passivation and work function tuning through attachment of heterogeneous organic monolayers on silicon in ultrahigh vacuum

    New search for: Cooper, A. J.
    New search for: Keyvanfar, K.
    New search for: Deberardinis, A.
    New search for: Pu, L.
    New search for: Bean, J. C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Dopant passivation and work function tuning through attachment of heterogeneous organic monolayers on silicon in ultrahigh vacuum

    Contributors:

    Cooper, A. J. (author) / Keyvanfar, K. (author) / Deberardinis, A. (author) / Pu, L. (author) / Bean, J. C. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 257 ; 6138-6144

    Publication date:

    2011-01-01

    Size:

    7 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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