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Effects of sputtering pressure on properties of copper oxide thin films prepared by rf magnetron sputtering
Effects of sputtering pressure on properties of copper oxide thin films prepared by rf magnetron sputtering
Effects of sputtering pressure on properties of copper oxide thin films prepared by rf magnetron sputtering
Darma, T.H. (author) / Ogwu, A.A. (author) / Placido, F. (author)
2011-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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