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    Effect of complexing agent on the properties of electrochemically deposited Cu2ZnSnS4 (CZTS) thin films

    New search for: Pawar, B. S.
    New search for: Pawar, S. M.
    New search for: Shin, S. W.
    New search for: Choi, D. S.
    New search for: Park, C. J.
    New search for: Kolekar, S. S.
    New search for: Kim, J. H.

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    Effect of complexing agent on the properties of electrochemically deposited Cu2ZnSnS4 (CZTS) thin films

    New search for: Pawar, B. S.
    New search for: Pawar, S. M.
    New search for: Shin, S. W.
    New search for: Choi, D. S.
    New search for: Park, C. J.
    New search for: Kolekar, S. S.
    New search for: Kim, J. H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of complexing agent on the properties of electrochemically deposited Cu2ZnSnS4 (CZTS) thin films

    New search for: Pawar, B. S.
    New search for: Pawar, S. M.
    New search for: Shin, S. W.
    New search for: Choi, D. S.
    New search for: Park, C. J.
    New search for: Kolekar, S. S.
    New search for: Kim, J. H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Effect of complexing agent on the properties of electrochemically deposited Cu2ZnSnS4 (CZTS) thin films

    Contributors:

    Pawar, B. S. (author) / Pawar, S. M. (author) / Shin, S. W. (author) / Choi, D. S. (author) / Park, C. J. (author) / Kolekar, S. S. (author) / Kim, J. H. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 257 ; 1786-1791

    Publication date:

    2010-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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