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    Effect of doping level on physical properties of antimony doped nanocrystaline tin oxide films fabricated using low cost spray technique

    New search for: Muruganantham, G.
    New search for: Ravichandran, K.
    New search for: Saravanakumar, K.
    New search for: Philominathan, P.
    New search for: Sakthivel, B.

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    Effect of doping level on physical properties of antimony doped nanocrystaline tin oxide films fabricated using low cost spray technique

    New search for: Muruganantham, G.
    New search for: Ravichandran, K.
    New search for: Saravanakumar, K.
    New search for: Philominathan, P.
    New search for: Sakthivel, B.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of doping level on physical properties of antimony doped nanocrystaline tin oxide films fabricated using low cost spray technique

    New search for: Muruganantham, G.
    New search for: Ravichandran, K.
    New search for: Saravanakumar, K.
    New search for: Philominathan, P.
    New search for: Sakthivel, B.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Effect of doping level on physical properties of antimony doped nanocrystaline tin oxide films fabricated using low cost spray technique

    Contributors:

    Muruganantham, G. (author) / Ravichandran, K. (author) / Saravanakumar, K. (author) / Philominathan, P. (author) / Sakthivel, B. (author)

    Published in:

    SURFACE ENGINEERING -LONDON- ; 27 ; 376-381

    Publication date:

    2011-01-01

    Size:

    6 pages

    ISSN:

    0267-0844

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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