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    Effects of deposition parameters on tantalum films deposited by direct current magnetron sputtering in Ar-O2 mixture

    New search for: Zhou, Y. M.
    New search for: Xie, Z.
    New search for: Xiao, H. N.
    New search for: Hu, P. F.
    New search for: He, J.

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    Effects of deposition parameters on tantalum films deposited by direct current magnetron sputtering in Ar-O2 mixture

    New search for: Zhou, Y. M.
    New search for: Xie, Z.
    New search for: Xiao, H. N.
    New search for: Hu, P. F.
    New search for: He, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effects of deposition parameters on tantalum films deposited by direct current magnetron sputtering in Ar-O2 mixture

    New search for: Zhou, Y. M.
    New search for: Xie, Z.
    New search for: Xiao, H. N.
    New search for: Hu, P. F.
    New search for: He, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Effects of deposition parameters on tantalum films deposited by direct current magnetron sputtering in Ar-O2 mixture

    Contributors:

    Zhou, Y. M. (author) / Xie, Z. (author) / Xiao, H. N. (author) / Hu, P. F. (author) / He, J. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 258 ; 1699-1703

    Publication date:

    2011-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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