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    Directional Photofluidization Lithography: Micro/Nanostructural Evolution by Photofluidic Motions of Azobenzene Materials

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    New search for: Kang, H. S.
    New search for: Park, J. K.

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    Directional Photofluidization Lithography: Micro/Nanostructural Evolution by Photofluidic Motions of Azobenzene Materials

    New search for: Lee, S.
    New search for: Kang, H. S.
    New search for: Park, J. K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Directional Photofluidization Lithography: Micro/Nanostructural Evolution by Photofluidic Motions of Azobenzene Materials

    New search for: Lee, S.
    New search for: Kang, H. S.
    New search for: Park, J. K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Document information
    Title:

    Directional Photofluidization Lithography: Micro/Nanostructural Evolution by Photofluidic Motions of Azobenzene Materials

    Contributors:

    Lee, S. (author) / Kang, H. S. (author) / Park, J. K. (author)

    Published in:

    ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 24 ; 2069-2103

    Publication date:

    2012-01-01

    Size:

    35 pages

    ISSN:

    0935-9648

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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