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Application of ICP Deep Trenches Etching in the Fabrication of FBAR Devices

Shang, Z.G. / Li, D.L. / Wang, S.Q. / Liu, J.H.

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Application of ICP Deep Trenches Etching in the Fabrication of FBAR Devices

Shang, Z.G. / Li, D.L. / Wang, S.Q. / Liu, J.H.

Application of ICP Deep Trenches Etching in the Fabrication of FBAR Devices

Shang, Z.G. / Li, D.L. / Wang, S.Q. / Liu, J.H.

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Check availability in my library

Order at Subito €

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Document information

Title:

Application of ICP Deep Trenches Etching in the Fabrication of FBAR Devices

Contributors:

Shang, Z.G. (author) / Li, D.L. (author) / Wang, S.Q. (author) / Liu, J.H. (author) / Wang, X.

Published in:

Micro-Nano Technology XIII Selected, peer reviewed papers from the 13th Annual Conference of Chinese Society of Micro-Nano Technology, September 28-30, 2011, Changchow, China ; 293-297

KEY ENGINEERING MATERIALS ; 503

Publication date:

2012-01-01

Size:

5 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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