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    Chemical vapor deposition growth of InN nanostructures: Morphology regulation and field emission properties

    New search for: Zhang, F.
    New search for: Wu, Q.
    New search for: Zhang, Y.
    New search for: Zhu, J.
    New search for: Liu, N.
    New search for: Yang, J.
    New search for: Wang, X.
    New search for: Hu, Z.

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    Chemical vapor deposition growth of InN nanostructures: Morphology regulation and field emission properties

    New search for: Zhang, F.
    New search for: Wu, Q.
    New search for: Zhang, Y.
    New search for: Zhu, J.
    New search for: Liu, N.
    New search for: Yang, J.
    New search for: Wang, X.
    New search for: Hu, Z.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Chemical vapor deposition growth of InN nanostructures: Morphology regulation and field emission properties

    New search for: Zhang, F.
    New search for: Wu, Q.
    New search for: Zhang, Y.
    New search for: Zhu, J.
    New search for: Liu, N.
    New search for: Yang, J.
    New search for: Wang, X.
    New search for: Hu, Z.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Chemical vapor deposition growth of InN nanostructures: Morphology regulation and field emission properties

    Contributors:

    Zhang, F. (author) / Wu, Q. (author) / Zhang, Y. (author) / Zhu, J. (author) / Liu, N. (author) / Yang, J. (author) / Wang, X. (author) / Hu, Z. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 258 ; 9701-9705

    Publication date:

    2012-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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